Ashley Diane Mason is currently pursuing a PhD in Materials Science. She received her Masters of Science in Electrical and Computer Engineering in Summer 2011, and her Bachelor of Science in Electrical Engineering in Spring 2009. In June of 2015, she started as an Integration Engineering Intern at Hewlett-Packard Corvallis.
From April to August of 2014, Ashley was a Materials Analysis Lab Graduate Intern at Intel Corporation in Hillsboro, Oregon. In the fall of 2012, Ashley was an R&D Engineering Student Intern at Hewlett-Packard in Corvallis responsible for characterizing 8 inch wafer-scale piezoelectric thin films using double beam laser interferometry. During the summer of 2009 and 2010, she moved to Washington DC to intern at the US Army Research Laboratory. Ashley’s earlier internship experiences were at Hewlett-Packard in Corvallis in Handheld Printing. Her manager was very supportive of her other interests in processing and analytical techniques, so he arranged arranged times for her to shadow employees within the Analytical and Development Labs.
While an undergraduate at Oregon State University, Ashley was a teaching assistant for freshman and sophomore level ECE courses. After choosing an emphasis in Materials and Devices, she transitioned to working in the Nanomaterials and Devices Lab. Her senior thesis project focused on examining the synthesis and energy harvesting capabilities of ZnO nanowires. During the 2009-2010 academic year, Ashley combined both her TA experience and interest in senior level coursework to be a teaching assistant for the ECE senior design class. Her MS thesis work focused on potential sensing applications for ZnO nanowires, increasing sensitivity by altering device geometry and improving selectivity using surface functionalization.